A Novel Abrasive Free Chemical Mechanical Planarization (AFCMP) of Non-Polar and Semi Polar III-V Nitride Surfaces
An Indian Patent – A NOVEL ABRASIVE FREE CHEMICAL MECHANICAL PLANARIZATION (AFCMP) OF NON-POLAR...
Read MoreAn Indian Patent – A NOVEL ABRASIVE FREE CHEMICAL MECHANICAL PLANARIZATION (AFCMP) OF NON-POLAR...
Read MoreThe Research paper by Prof. Ajailiu Niumai, Head, Centre for Social Exclusion & Inclusive...
Read MoreGlobal demand for increasing the food production is becoming a big challenge for researchers. ...
Read MoreNeuroSAFE, the recently launched ground-breaking Testing Platform by Transcell Oncologics Pvt Ltd,...
Read MoreReaGene Innovations Pvt Ltd a start-up at University of Hyderabad’s Incubation center,...
Read MoreMr. Shubham Dutta (lead author), currently working as a PhD Research Scholar under the guidance of...
Read MoreA team consisting of R Balamurugan and Mou Mandal from School of Chemistry, University of...
Read MoreA new study from the University of Hyderabad (UoH) in collaboration with the University of Exeter,...
Read MoreCan you imagine the electronic or photonic devices without Silicon (Si) or the derivative of Si?...
Read MoreThe Artificial Intelligence & Machine learning enabled blockchain platform developed by...
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